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ELECTROSYNTHESIZED NiS2 THIN FILMS AND THEIR CHARACTERIZATION STUDIES

K.M. Rajan, Rajes and Abdul Aziz, Mohd Zaidan Bin and T., Joseph Sahaya Anand (2012) ELECTROSYNTHESIZED NiS2 THIN FILMS AND THEIR CHARACTERIZATION STUDIES. In: iDECON 2012 – International Conference on Design and Concurrent Engineering, 15 - 16, October 2012, Hotel Equatorial, Melaka.

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Abstract

Nickel Sufide (NiS2) thin films were prepared by using Electrodeposition on Indium-tin Oxide coated glass (ITO). Films are characterized using X-ray diffraction for their crystallographic analysis. From scanning electron micrographs, the surface appears to be comparatively granular with grains in irregularly shaped. From optical analysis, the bandgap range is between 1.22- 1.15eV with indirect band gap nature. From Mott-Schottky plots the films are found to be n-type and the semiconductor parameters of the film are derived. Films show polycrystalline in nature with good uniformity.

Item Type: Conference or Workshop Item (Speech)
Uncontrolled Keywords: X-Ray diffraction, scanning electron micrograph, optical, Mott- Schottky
Subjects: T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Manufacturing Engineering > Department of Engineering Materials
Depositing User: Dr. T. Joseph Sahaya Anand
Date Deposited: 26 Mar 2013 04:38
Last Modified: 28 May 2015 03:46
URI: http://eprints.utem.edu.my/id/eprint/6962

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