TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films

T., Joseph Sahaya Anand (2011) TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. In: International Conference on Nanotechnology and Ultrasound, 12 - 14 January 2011, Tiruchirapalli, INDIA.

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The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found.

Item Type: Conference or Workshop Item (Paper)
Additional Information: Invited Talk
Uncontrolled Keywords: dc magnetron sputtering, crystallographic structure, transmission electron microscope, thin film
Subjects: T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Manufacturing Engineering > Department of Engineering Materials
Depositing User: Dr. T. Joseph Sahaya Anand
Date Deposited: 21 Nov 2013 03:39
Last Modified: 28 May 2015 04:09
URI: http://eprints.utem.edu.my/id/eprint/10147
Statistic Details: View Download Statistic

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