HRTEM analysis of magnetron sputtered Ni4Al thin films

T., Joseph Sahaya Anand and Mohd Abid, Mohd Asyadi Azam and Sivarao, Subramonian and Buang, Zolkepli and Rajes, KM Rajan and Hazliza, Nurul and Mohd Zaidan, Abd Aziz and Chua, Kok Yau (2015) HRTEM analysis of magnetron sputtered Ni4Al thin films. Applied Mechanics and Materials, 761. pp. 504-509. ISSN 1660-9336

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The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope (TEM). An expansion of the lattice by nearly 5% was observed for the synthesized films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni4Al films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. A grain coalescence trend was found for the Ni4Al films during the in situ annealing above 500°C. This can be the main reason for the abnormal grain growth of these films at these high temperatures.

Item Type: Article
Uncontrolled Keywords: intermetallic thin films, DC magnetron sputtering, crystallographic structure, transmission electron microscope
Subjects: T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Manufacturing Engineering > Department of Engineering Materials
Depositing User: Dr. T. Joseph Sahaya Anand
Date Deposited: 30 Mar 2015 07:31
Last Modified: 28 May 2015 04:37
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