NANOSTRUCTURAL STUDIES OF SPUTTER-DEPOSITED NixAl1-x (0.5 ≤ x ≤ 1.0) ALLOY THIN FILMS

T., Joseph Sahaya Anand and A., H.W. Ngan (2011) NANOSTRUCTURAL STUDIES OF SPUTTER-DEPOSITED NixAl1-x (0.5 ≤ x ≤ 1.0) ALLOY THIN FILMS. Malaysian Journal of Microscopy, 7. pp. 221-227. ISSN 1823 7010

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Abstract

The nanostructural characteristics of direct-current magnetron sputter-deposited NixAl1-x (0.5 ≤ x ≤ 1.0) alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.5Al0.5 and the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase for Ni0.5Al0.5 and Ni5Al3 phase with orthorhombic structure for Ni0.65Al0.35 were found.

Item Type: Article
Uncontrolled Keywords: dc magnetron sputtering, crystallographic structure, transmission electron microscope, thin film
Subjects: T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Manufacturing Engineering > Department of Engineering Materials
Depositing User: Dr. T. Joseph Sahaya Anand
Date Deposited: 16 Dec 2013 06:15
Last Modified: 28 May 2015 04:09
URI: http://eprints.utem.edu.my/id/eprint/10139
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