Deposition of Micro Contact Based Probe Cell for IC Testing by Dc Magnetron Sputtering Technique

Muhammad Idzdihar , Idris and Nowshad , Amin and Faiz , Arith and Siti Amaniah, Mohd Chachuli (2014) Deposition of Micro Contact Based Probe Cell for IC Testing by Dc Magnetron Sputtering Technique. Research Journal of Applied Sciences, Engineering and Technology. pp. 2701-2704. ISSN 2040-7459

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Abstract

This study presents the deposition of micro contact probe cell for IC testing deposited by dc sputtering technique on a glass substrate. Micro contact with thickness of 2800-7000 nm were deposited from Copper target at sputtering power of 125 W in argon ambient at a room temperature on a base layer of copper using mask. Then, the micro contacts were investigated by using profilometer. All the obtained results show the potential viability of the novel test fixture and thus solve the limitation

Item Type:	Article
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:	Faculty of Electronics and Computer Engineering > Department of Computer Engineering
Depositing User:	MUHAMMAD IDZDIHAR IDRIS
Date Deposited:	03 Jun 2014 01:02
Last Modified:	28 May 2015 04:25
URI:	http://eprints.utem.edu.my/id/eprint/12547
Statistic Details:	View Download Statistic

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