Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target

Mohd Rosli, z.m.rosli and Kwan, Wai Loon and Jariah, Mohamad Juoi and Nafarizal , Nayan and Zainab , Mahamud and Yusliza, Yusuf (2013) Characterization of TiAlBN Nanocomposite Coating deposited via Radio Frequency Magnetron Sputtering using Single Hot-Pressed Target. Advanced Materials Research, Vol. 626 (2013). pp. 298-301. ISSN 1022-6680

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Abstract

TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On theother hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers).

Item Type:	Article
Subjects:	Q Science > Q Science (General) T Technology > TA Engineering (General). Civil engineering (General)
Divisions:	Faculty of Manufacturing Engineering > Department of Engineering Materials
Depositing User:	Dr. Zulkifli Mohd Rosli
Date Deposited:	05 Feb 2014 08:13
Last Modified:	28 May 2015 04:14
URI:	http://eprints.utem.edu.my/id/eprint/10954
Statistic Details:	View Download Statistic

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