T. Joseph, Sahaya Anand (2011) TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. In: International Conference on Nanotechnology and Ultrasound, 12 - 14 January 2011, Tiruchirapalli, INDIA.
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Abstract
The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | Invited Talk |
| Uncontrolled Keywords: | dc magnetron sputtering, crystallographic structure, transmission electron microscope, thin film |
| Subjects: | T Technology > TJ Mechanical engineering and machinery |
| Divisions: | Faculty of Manufacturing Engineering > Department of Engineering Materials |
| Depositing User: | Dr. T. Joseph Sahaya Anand |
| Date Deposited: | 25 Jul 2012 00:20 |
| Last Modified: | 28 May 2015 03:27 |
| URI: | http://eprints.utem.edu.my/id/eprint/4708 |
| Statistic Details: | View Download Statistic |
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- TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. (deposited 25 Jul 2012 00:20) [Currently Displayed]
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