Modeling And Optimization Of Physical Vapour Deposition Coating Process Parameters For Tin Grain Size Using Combined Genetic Algorithms With Response Surface Methodology

Mohamad Jaya, Abdul Syukor and Muhamad, Mohd Razali and Abd Rahman, Md Nizam and Mohammad Jarrah, Mu'ath Ibrahim and Hasan Basari, Abd Samad (2015) Modeling And Optimization Of Physical Vapour Deposition Coating Process Parameters For Tin Grain Size Using Combined Genetic Algorithms With Response Surface Methodology. Journal Of Theoretical And Applied Information Technology, 77. pp. 236-252. ISSN 1992-8645

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Abstract

Optimization of thin film coating parameters is important in identifying the required output.Two main issues of the process of physical vapor deposition (PVD) are manufacturing costs and customization of cutting tool properties.The aim of this study is to identify optimal PVD coating process parameters.Three process parameters were selected, namely nitrogen gas pressure (N2),argon gas pressure (Ar),and Turntable Speed (TT),while thin film grain size of titanium nitrite (TiN) was selected as an output response.Coating grain size was characterized using Atomic Force Microscopy (AFM) equipment.In this paper,to obtain a proper output result,an approach in modeling surface grain size of Titanium Nitrite (TiN)coating using Response Surface Method (RSM) has been implemented. Additionally,analysis of variance(ANOVA) was used to determine the significant factors influencing resultant TiN coating grain size.Based on that,a quadratic polynomial model equation was developed to represent the process variables and coating grain size.Then,in order to optimize the coating process parameters, genetic algorithms (GAs) were combined with the RSM quadratic model and used for optimization work.Finally,the models were validated using actual testing data to measure model performances in terms of residual error and prediction interval (PI).The result indicated that for RSM,the actual coating grain size of validation runs data fell within the 95% (PI) and the residual errors were less than 10 nm with very low values, the prediction accuracy of the model is 96.09%.In terms of optimization and reduction the experimental data,GAs could get the best lowest value for grain size then RSM with reduction ratio of ≈6%, ≈5%, respectively.

Item Type:	Article
Uncontrolled Keywords:	TiN, Grain Size, Modeling, Sputtering, PVD, RSM, Genetic Algorithms.
Subjects:	T Technology > T Technology (General) T Technology > TA Engineering (General). Civil engineering (General)
Divisions:	Faculty of Information and Communication Technology
Depositing User:	Mohd. Nazir Taib
Date Deposited:	05 Dec 2018 02:52
Last Modified:	12 Jul 2021 18:14
URI:	http://eprints.utem.edu.my/id/eprint/20984
Statistic Details:	View Download Statistic

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